Formation of Titanium Nitride Film by Ion Plating Technique Using Electron-Beam-Excited Plasma
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چکیده
منابع مشابه
Annealing effect on ion-beam-sputtered titanium dioxide film.
We found that the extinction coefficient of ion-beam-sputtered titanium dioxide films first decreased with increasing annealing temperature then increased drastically when annealing temperature was increased above ~200 degrees C for 24 h of annealing time. The decreasing extinction coefficient with annealing temperature was attributed to a reduction in absorption owing to oxidation of the film ...
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ژورنال
عنوان ژورنال: IEEJ Transactions on Fundamentals and Materials
سال: 1996
ISSN: 0385-4205,1347-5533
DOI: 10.1541/ieejfms1990.116.5_392